*¸¦µæÀ®²Ì 2006ǯ [#g4892a34]
**ÏÀʸ¡¦¥×¥í¥·¡¼¥Ç¥£¥ó¥°¥¹ [#c9f76f2d]
***ººÆÉÉÕ¤­ [#p84661dd]

-»³Æâͦ¡¢»°ÉÊÌÀÀ¸¡¢ÀÖËÙͧɧ¡¢Æ£¸¶¹¯Ê¸:&br;
"¸ÇÁêÈ¿±þ¤Ë¤è¤ë¥Ð¥ë¥¯b-FeSi2·ë¾½À¸À®ÍÑ¥í¥Ã¥É¾õÀ°Î󶦾½ÁÈ¿¥¤Î·ÁÀ®¤È¤½¤ÎÊý°Ì²òÀÏ"&br;
ºàÎÁ ''55''(2) (2006) pp. 148-152.

-K. Yamaoka, Y. Yoshizako, H. Kato, D. Tsukiyama, Y. Terai and Y. Fujiwara:&br;
"Room-temperature plasma-enhanced chemical vapor deposition of stable SiOCH films using tetraethoxysilane"&br;
Physica B ''376-377'' (2006) pp. 399-402.

-K. Nakamura, S. Takemoto, Y. Terai, M. Suzuki, A. Koizumi, Y. Takeda, M. Tonouchi and Y. Fujiwara:&br;
"Direct observation of trapping of photoexcited carriers in Er,O-codoped GaAs"&br;
Physica B ''376-377'' (2006) pp. 556-559.

-A. Mishina, T. Akahori, Y. Terai, I. Yamauchi and Y. Fujiwara:&br;
"Growth of bulk β-FeSi&subsc{2}; crystals by annealing of well aligned solidification structures"&br;
Physica B ''376-377'' (2006) pp. 795-798.

-Y. Terai, Y. Maeda and Y. Fujiwara:&br;
"Photoluminescence enhancement of β-FeSi&subsc{2}; crystals by optimizing Al doping concentration"&br;
Physica B ''376-377'' (2006) pp. 799-802.

-K. Yamaoka, Y. Yoshizako, H. Kato, D. Tsukiyama, Y. Terai and Y. Fujiwara:&br;
"Thermal stability of SiOCH films deposited by room-temperature plasma-enhanced Chemical vapor deposition using tetraethoxysilane"&br;
Transactions of the Materials Research Society of Japan ''31''(2) (2006) pp. 495-498.

-Y. Yoshizako, D. Tsukiyama, D. Nakamura, K. Yamaoka, Y. Terai and Y. Fujiwara:&br;
"Plasma diagnosis of remote PECVD for SiOCH deposition at low temperature"&br;
Transactions of the Materials Research Society of Japan ''31''(2) (2006) pp. 499-502.

-S. Takemoto, T. Terao, Y. Terai, M. Yoshida, A. Koizumi, H. Ohta, Y. Takeda, N. Fujimura and Y. Fujiwara:&br;
"Magnetic properties of Er,O-codoped GaAs at low temperature"&br;
Physica Status Solidi (c) ''3''(12) (2006) pp. 4082-4085.


***ººÆɤʤ· [#i149f22d]

-Y. Terai, Y. Maeda and Y. Fujiwara:&br;
"Photoluminescence properties of ion-beam synthesized b-FeSi2/Si interface"&br;
Proceedings of the International Workshop on Sustainable Energy and Materials (Tokyo, Japan, September 5, 2006) pp. 3-39-3-42.

-K. Yamaoka, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Room-temperature growth of silicon oxide films by plasma-enhanced chemical vapor deposition"&br;
Proceedings of the International Workshop on Sustainable Energy and Materials (Tokyo, Japan, September 5, 2006) pp. 3-83-3-86.

-K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Thermally stable carbon-doped silicon oxide films deposited at room temperature"&br;
Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials (Yokohama, Japan, September 12-15, 2006).

-N. Tawara, H. Ohmi, Y. Terai, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br;
"Characterization of epitaxial silicon films grown by atmosheric pressure plasma chemical vapor deposition at low temperatures (450-600oC)"&br;
Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials (Yokohama, Japan, September 12-15, 2006) pp. 1094-1095.

-N. Tawara, H. Ohmi, Y. Terai, T. Shimura, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br;
"Characterization of epitaxial Si films grown at low temperatures by atmospheric pressure plasma chemical vapor deposition"&br;
Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology (Osaka, Japan, October 19-20, 2006) pp. 69-70.




**¹ñºÝ²ñµÄȯɽ [#j38018c8]


-Y. Fujiwara, K. Nakamura, S. Takemoto, J. Sugino, Y. Terai, M. Suzuki and M. Tonouchi:&br;
"Direct observation of picosecond-scale energy-transfer processes in Er,O-codoped GaAs by pump-probe reflection technique"&br;
28th International Conference on Physics of Semiconductors (ICPS-28), ''FrM2g.33'', Vienna, Austria, July 24-28 (2006).

-Y. Terai, Y. Maeda and Y. Fujiwara:&br;
"Nondestructive investigation of b-FeSi2/Si interface by photoluminescence measurements"&br;
Asia-Pacific Conference on Semiconducting Silicides: Science and Technology towards Sustainable Optoelectronics (APAC-SILICIDE 2006), ''B-2'', Kyoto, Japan, July 29-31 (2006).

-Y. Terai, A. Mishina, I. Yamauchi and Y. Fujiwara:&br;
"Growth of bulk b-FeSi2 by peritectoid reaction of faceted e-FeSi and a-Fe2Si5 single crystals"&br;
Asia-Pacific Conference on Semiconducting Silicides: Science and Technology towards Sustainable Optoelectronics (APAC-SILICIDE 2006), ''D-4'', Kyoto, Japan, July 29-31 (2006).

-T. Tokuno, H. Ichida, Y. Terai, Y. Kanematsu and Y. Fujiwara:&br;
"Oxygen concentration dependence of photoluminescence properties in Er, O-codoped GaAs"&br;
International Symposium on Design of Advanced Materials Using Nano Space (ISDAM-2006), ''P-34'', Osaka, Japan, August 4 (2006).

-K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Electrical properties of carbon-doped silicon oxide films deposited using TEOS at room temperature"&br;
International Symposium on Design of Advanced Materials Using Nano Space (ISDAM-2006), ''P-71'', Osaka, Japan, August 4 (2006).

-S. Takemoto, T. Terao, Y.Terai, M. Yoshida, A. Koizumi, H. Ohta, Y. Takeda, N. Fujimura and Y. Fujiwara:&br;
"Magnetic properties of Er,O-codoped GaAs at low temperature"&br;
4th International Conference on Physics and Applications of Spin Related Phenomena in Semiconductors (PASPS-IV), ''PB-43'', Sendai, Japan, August 15-18 (2006).

-Y. Terai, Y. Maeda and Y. Fujiwara:&br;
"Photoluminescence properties of ion-beam synthesized b-FeSi2/Si interface"&br;
International Workshop on Sustainable Energy and Materials (IWSEM2006), ''3-3-3'', Tokyo, Japan, September 5 (2006).&br;
¡Ú¾·ÂÔ¹Ö±é¡Û

-K. Yamaoka, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Room-temperature growth of silicon oxide films by plasma-enhanced chemical vapor deposition"&br;
International Workshop on Sustainable Energy and Materials (IWSEM2006), ''3-p-7'', Tokyo, Japan, September 5 (2006).

-K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Thermally stable carbon-doped silicon oxide films deposited at room temperature"&br;
2006 International Conference on Solid State Devices and Materials (SSDM 2006), ''P-2-3'', Yokohama, Japan, September 12-15 (2006).

-N. Tawara, H. Ohmi, Y. Terai, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br;
"Characterization of epitaxial silicon films grown by atmosheric pressure plasma chemical vapor deposition at low temperatures (450-600°C)"&br;
2006 International Conference on Solid State Devices and Materials (SSDM 2006), ''I-8-4'', Yokohama, Japan, September 12-15 (2006).

-N. Tawara, H. Ohmi, Y. Terai, T. Shimura, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br;
"Characterization of epitaxial Si films grown at low temperatures by atmospheric pressure plasma chemical vapor deposition"&br;
International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, October 19-20 (2006).

-Y. Fujiwara, S. Takemoto, T. Tokuno, K. Hidaka, H. Ichida, M. Suzuki, Y. Terai, Y. Kanematsu and M. Tonouchi:&br;
"Mechanism of excitation and relaxation in Er,O-codoped GaAs for 1.5mm light-emitting devices with extremely stable wavelength"&br;
2nd Workshop on Impurity Based Electroluminescence Devices and Materials (IBEDM 2006), ''F-17'', Wakayama, Japan, October 17-20 (2006).&br;
¡Ú¾·ÂÔ¹Ö±é¡Û



**¹ñÆâ²ñµÄȯɽ [#u289af6a]

-»³²¬·ÄÍ´¡¤µÈÇ÷͵»Ê¡¤²ÃÆ£±ÑÌÀ¡¤ÃÛ»³ÂçÊ塤Ãæ¼ÂçÊ塤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br;
"TEOS¤òÍѤ¤¤ÆºîÀ½¤·¤¿SiOCHËì¤Ë´Þ¤Þ¤ì¤ëú²½¿åÁÇ´ð¤ÎǮŪµóÆ°"&br;
Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''22p-ZP-1''¡Ö¹Ö±é¾©Îå¾Þ¼õ¾Þµ­Ç°¹Ö±é¡×¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륭¥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006).

-ÃÛ»³ÂçÊ塤»³²¬·ÄÍ´¡¤Ãæ¼ÂçÊ塤µÈÇ÷͵»Ê¡¤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br;
"¥ê¥â¡¼¥È¥×¥é¥º¥ÞCVDË¡¤Ë¤è¤ëSiOCHËì¤ÎÄã²¹À®Ë쵡¹½¤Î¸¡Æ¤"&br;
Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''22p-ZP-2''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륭¥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006).

-ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br;
"Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëEr¸÷Î嵯ÃÇÌÌÀѤλÀÁÇÇ»Åٰ͸À­"&br;
Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''23p-ZR-13''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륭¥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006).

-ÃÝËܾ±°ì¡¢Ãæ¼°ìɧ¡¢»û°æ·ÄÏ¡¢ÎëÌÚÀµ¿Í¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢ÅÍÆâÀ¯µÈ¡¢Æ£¸¶¹¯Ê¸¡§&br;
"Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ë¸÷Î嵯¥­¥ã¥ê¥¢¤Î´ËϤȥ¨¥Í¥ë¥®¡¼Í¢Á÷(2)"&br;
Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''23p-ZR-14''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륭¥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006).

-»°ÉÊÌÀÀ¸¡¢»û°æ·ÄÏ¡¢»³Æâͦ¡¢Æ£¸¶¹¯Ê¸¡§&br;
"¥Õ¥¡¥»¥Ã¥È²½¤·¤¿e-FeSi¤Èa-Fe&subsc{2};Si&subsc{5};¤ÎÊñÀÏÈ¿±þ¤Ë¤è¤ëb-FeSi&subsc{2};·ë¾½¤ÎºîÀ½"&br;
Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''26a-C-7''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륭¥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î26Æü (2006).

-Åĸ¶Ä¾¹ä¡¢Â绲¹¨¾»¡¢»û°æ·ÄÏ¡¢³ÀÆâ¹°¾Ï¡¢ÅÏÉôÊ¿»Ê¡¢Æ£¸¶¹¯Ê¸¡¢°ÂÉð·é¡§&br;
"Â絤°µ¥×¥é¥º¥ÞCVDË¡¤Ë¤è¤Ã¤ÆÄã²¹À®Ä¹¤·¤¿Si¥¨¥Ô¥¿¥­¥·¥ã¥ëËì¤Îɾ²Á"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''29a-X-8''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î29Æü (2006).

-»³²¬·ÄÍ´¡¤µÈÇ÷͵»Ê¡¤²ÃÆ£±ÑÌÀ¡¤ÃÛ»³ÂçÊ塤Ãæ¼ÂçÊ塤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br;
"TEOS¤òÍѤ¤¤ÆºîÀ½¤·¤¿SiOCHËì¤Ë´Þ¤Þ¤ì¤ëú²½¿åÁÇ´ð¤ÎǮŪµóÆ°"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''29p-X-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î29Æü (2006).

-Æü¹â·½Æó¡¢Ê¿¾¾Î´¡¢Æ£°æ·Å¡¢»û°æ·ÄÏ¡¢Æ£¸¶¹¯Ê¸¡§&br;
"OMVPEÀ®Ä¹¤·¤¿Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëGaAs¥Ð¥ó¥Éüȯ¸÷¤Îɾ²Á"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''30a-H-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î30Æü (2006).

-ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br;
"ÅÅήÃíÆþ·¿Er,O¶¦Åº²ÃGaAsȯ¸÷¥Ç¥Ð¥¤¥¹¤Ë¤ª¤±¤ëErÎ嵯ÃÇÌÌÀѤάÄê²¹Åٰ͸À­"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''30a-H-6''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î30Æü (2006).

-»û°æ·ÄÏ¡¢¶¶ËÜÀµÂÀϺ¡¢Æ£¸¶¹¯Ê¸¡¢ÆîÆâ»Ì¡¢µÜÅĽӹ°¡¢ÀаæÞ­¡§&br;
"³Æ¼ïÅ´¥½¡¼¥¹¤«¤éºîÀ½¤·¤¿b-FeSi&subsc{2};¤Îȯ¸÷¥¹¥Ú¥¯¥È¥ë"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''31p-RD-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î31Æü (2006).

-ÃÝËܾ±°ì¡¢Æü¹â·½Æó¡¢»û°æ·ÄÏ¡¢ÎëÌÚÀµ¿Í¡¢ÅÍÆâÀ¯µÈ¡¢Æ£¸¶¹¯Ê¸¡§&br;
"Æ©²á·¿¥Ý¥ó¥×¡¾¥×¥í¡¼¥ÖË¡¤Ë¤è¤ëErź²ÃGaAs¤Ë¤ª¤±¤ë¸÷Î嵯¥­¥ã¥ê¥¢¥À¥¤¥Ê¥ß¥¯¥¹"&br;
Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''1a-P15-37''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥­¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢9·î1Æü (2006).

-Æ£°æ·Å¡¢Æüüâ·½Æó¡¢Ê¿¾¾Î´¡¢»û°æ·ÄÏ¡¢Æ£¸¶¹¯Ê¸¡§&br;
"OMVPEÀ®Ä¹¤·¤¿Er,O¶¦Åº²ÃGaAs¤Îȯ¸÷ÆÃÀ­¤ËµÚ¤Ü¤¹´ðÈIJ¹Å٤αƶÁ"&br;
ÆüËܶⰳزñ2006ǯ½©´ü¡ÊÂè139²ó¡ËÂç²ñ¡¢''683''¡¢¿·³ãÂç³Ø¡¢¿·³ã»Ô¡¢(2006).




**¸¦µæ²ñ [#t64be420]

-Æ£¸¶¹¯Ê¸¡¢Æ£Â¼µªÊ¸¡¢ÂÀÅĿΡ¢ÂçÞ¼ÇîÀë¡¢ÅÍÆâÀ¯µÈ¡¢Çò°æ¸÷±À¡§&br;
"´õÅÚÎีÁÇź²ÃȾƳÂΤο·Å¸³«¡§Ãá½øÀ©¸æ¤Ë¤è¤ë¿·¤·¤¤¥¹¥Ô¥óʪÀ­¤Îȯ¸½"&br;
ʸÉô²Ê³Ø¾Ê²Ê³Ø¸¦µæÈñÊä½õ¶âÆÃÄêÎΰ踦µæ¡ÖȾƳÂΥʥΥ¹¥Ô¥ó¥È¥í¥Ë¥¯¥¹¡×¡¢Ê¿À®17ǯÅÙ¸¦µæÀ®²ÌÊó¹ð²ñ¡¢Åìµþ¹©¶ÈÂç³Ø¥Ç¥£¥¸¥¿¥ë¿ÌÜŪ¥Û¡¼¥ë¡¢ÅìµþÅÔÌܹõ¶è¡¢1·î25Æü (2006).

-Æ£¸¶¹¯Ê¸¡§&br;
"¥Ü¥È¥à¥¢¥Ã¥×·¿µ¡Ç½À©¸æ¤Ë¤è¤ë¹â¼¡Î̻ҵ¡Ç½ºàÎÁ¤ÎÁÏÀ½"&br;
ÂçºåÂç³ØÀèüµ»½Ñ¥Ç¥¶¥¤¥ó¥»¥ó¥¿¡¼¥ï¡¼¥­¥ó¥°¥°¥ë¡¼¥×¡¡Âè1²ó¥·¥ó¥Ý¥¸¥¦¥à¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢1·î27Æü (2006).

-Æ£¸¶¹¯Ê¸¡¢»û°æ·ÄÏ¡¢ÅÍÆâÀ¯µÈ¡¢»ÔÅĽ¨¼ù¡§&br;
"´õÅÚÎàź²ÃȾƳÂΤÎÃá½øÀ©¸æ¤È¹â¼¡È¯¸÷µ¡Ç½¤Îȯ¸½"&br;
ʸÉô²Ê³Ø¾Ê²Ê³Ø¸¦µæÈñÊä½õ¶âÆÃÄêÎΰ踦µæ¡Ö´õÅÚÎà·ÁÂÖÀ©¸æ¡×Ê¿À®17ǯÅÙÀ®²Ìȯɽ²ñ¡¢ÂçºåÂç³ØÃæÇ·Å祻¥ó¥¿¡¼¡¢Âçºå»ÔË̶衢1·î31Æü (2006).

-Æ£¸¶¹¯Ê¸¡§&br;
"¥Ü¥È¥à¥¢¥Ã¥×·¿µ¡Ç½À©¸æ¤Ë¤è¤ë¿·µ¬Î̻ҵ¡Ç½ºàÎÁ¤ÎÁÏÀ½"&br;
21À¤µªCOE¥×¥í¥°¥é¥à¡Ö¹½Â¤¡¦µ¡Ç½Àè¿ÊºàÎÁ¥Ç¥¶¥¤¥ó¸¦µæµòÅÀ¤Î·ÁÀ®¡×Âè4²ó¥·¥ó¥Ý¥¸¥¦¥à¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î8Æü (2006).

-Æ£¸¶¹¯Ê¸¡§&br;
"´õÅÚÎàź²ÃȾƳÂΤò´ðÈפȤ·¤¿ÇÈĹĶ°ÂÄêȯ¸÷¥Ç¥Ð¥¤¥¹¤Î³«È¯"&br;
2005ǯÅÙÂçºåÂç³ØÀèü²Ê³Ø¥¤¥Î¥Ù¡¼¥·¥ç¥ó¥»¥ó¥¿¡¼VBLÉôÌç¸ø³«À®²Ìȯɽ²ñ¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î15Æü (2006).

-ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br;
"Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëErÎ嵯ÃÇÌÌÀѤÎɾ²Á"&br;
2005ǯÅÙÂçºåÂç³ØÀèü²Ê³Ø¥¤¥Î¥Ù¡¼¥·¥ç¥ó¥»¥ó¥¿¡¼VBLÉôÌç¸ø³«À®²Ìȯɽ²ñ¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î15Æü (2006).

-Æ£¸¶¹¯Ê¸¡§&br;
"­·-­¹Â²²½¹çʪȾƳÂθ÷¥Ç¥Ð¥¤¥¹¤Î¿·¤·¤¤Ä¬Î®"&br;
ÆüËܶⰳزñ¥»¥ß¥Ê¡¼¡ÖÈ󥷥ꥳ¥óȾƳÂΤθ½¾õ¤ÈŸ˾¡×¡¢Ê¸Éô²Ê³Ø¾Ê¸¦µæ¸òή¥»¥ó¥¿¡¼¡¢¤Ä¤¯¤Ð»Ô¡¢3·î29Æü (2006).

-K. Hidaka, T. Hiramatsu, Y. Terai and Y. Fujiwara:&br;
"Photoluminescence properties of Er,O-codoped GaAs grown by organometallic vapor phase epitaxy using Er(DPM)&subsc{3};"&br;
25th Electronic Materials Symposium, ''A4'', pp. 10-11¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006).

-S. Takemoto, K. Nakamura, K. Hidaka, Y. Terai, M. Suzuki, M. Tonouchi and Y. Fujiwara:&br;
"Ultrafast relaxation process of photoexcited carriers in Er-doped GaAs"&br;
25th Electronic Materials Symposium, ''A5'', pp. 12-13¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006).

-T. Tokuno, S. Kawamura, H. Ichida, Y. Terai, A. Koizumi, Y. Takeda, Y. Kanematsu and Y. Fujiwara:&br;
"Oxygen concentration dependence of Er optical excitation cross section in Er,O-codoped GaAs"&br;
25th Electronic Materials Symposium, ''A6'', pp. 14-15¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006).

-D. Tsukiyama, K. Yamaoka, D. Nakamura, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Investigation of low-temperature deposition of SiOCH film by remote plasma-enhanced chemical vapor deposition using TEOS"&br;
25th Electronic Materials Symposium, ''J4'', pp. 258-259¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î7Æü (2006).

-K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br;
"Thermal stability and electrical properties of SiOCH films deposited PECVD at low temperature"&br;
25th Electronic Materials Symposium, ''J6'', pp. 262-263¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î7Æü (2006).

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-T. Tokuno, A. Fujita, H. Ichida, Y. Terai, Y. Kanematsu and Y. Fujiwara:&br;
"Investigation on the mechanism of Er luminescence in Er,O-codoped GaAs"&br;
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-Y. Fujiwara, A. J. Kenyon, B. Moine and P. Ruterana:&br;
Optical Materials 28(6-7) (2006) pp. 575-896. [Rare earth doped photonic materials. Proceedings of the European Materials Research Society 2005 Spring Meeting - Symposium C].



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