*¸¦µæÀ®²Ì 2006ǯ [#g4892a34] **ÏÀʸ¡¦¥×¥í¥·¡¼¥Ç¥£¥ó¥°¥¹ [#c9f76f2d] ***ººÆÉÉÕ¤ [#p84661dd] -»³Æâͦ¡¢»°ÉÊÌÀÀ¸¡¢ÀÖËÙͧɧ¡¢Æ£¸¶¹¯Ê¸:&br; "¸ÇÁêÈ¿±þ¤Ë¤è¤ë¥Ð¥ë¥¯b-FeSi2·ë¾½À¸À®ÍÑ¥í¥Ã¥É¾õÀ°Î󶦾½ÁÈ¿¥¤Î·ÁÀ®¤È¤½¤ÎÊý°Ì²òÀÏ"&br; ºàÎÁ ''55''(2) (2006) pp. 148-152. -K. Yamaoka, Y. Yoshizako, H. Kato, D. Tsukiyama, Y. Terai and Y. Fujiwara:&br; "Room-temperature plasma-enhanced chemical vapor deposition of stable SiOCH films using tetraethoxysilane"&br; Physica B ''376-377'' (2006) pp. 399-402. -K. Nakamura, S. Takemoto, Y. Terai, M. Suzuki, A. Koizumi, Y. Takeda, M. Tonouchi and Y. Fujiwara:&br; "Direct observation of trapping of photoexcited carriers in Er,O-codoped GaAs"&br; Physica B ''376-377'' (2006) pp. 556-559. -A. Mishina, T. Akahori, Y. Terai, I. Yamauchi and Y. Fujiwara:&br; "Growth of bulk β-FeSi&subsc{2}; crystals by annealing of well aligned solidification structures"&br; Physica B ''376-377'' (2006) pp. 795-798. -Y. Terai, Y. Maeda and Y. Fujiwara:&br; "Photoluminescence enhancement of β-FeSi&subsc{2}; crystals by optimizing Al doping concentration"&br; Physica B ''376-377'' (2006) pp. 799-802. -K. Yamaoka, Y. Yoshizako, H. Kato, D. Tsukiyama, Y. Terai and Y. Fujiwara:&br; "Thermal stability of SiOCH films deposited by room-temperature plasma-enhanced Chemical vapor deposition using tetraethoxysilane"&br; Transactions of the Materials Research Society of Japan ''31''(2) (2006) pp. 495-498. -Y. Yoshizako, D. Tsukiyama, D. Nakamura, K. Yamaoka, Y. Terai and Y. Fujiwara:&br; "Plasma diagnosis of remote PECVD for SiOCH deposition at low temperature"&br; Transactions of the Materials Research Society of Japan ''31''(2) (2006) pp. 499-502. -S. Takemoto, T. Terao, Y. Terai, M. Yoshida, A. Koizumi, H. Ohta, Y. Takeda, N. Fujimura and Y. Fujiwara:&br; "Magnetic properties of Er,O-codoped GaAs at low temperature"&br; Physica Status Solidi (c) ''3''(12) (2006) pp. 4082-4085. ***ººÆɤʤ· [#i149f22d] -Y. Terai, Y. Maeda and Y. Fujiwara:&br; "Photoluminescence properties of ion-beam synthesized b-FeSi2/Si interface"&br; Proceedings of the International Workshop on Sustainable Energy and Materials (Tokyo, Japan, September 5, 2006) pp. 3-39-3-42. -K. Yamaoka, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Room-temperature growth of silicon oxide films by plasma-enhanced chemical vapor deposition"&br; Proceedings of the International Workshop on Sustainable Energy and Materials (Tokyo, Japan, September 5, 2006) pp. 3-83-3-86. -K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Thermally stable carbon-doped silicon oxide films deposited at room temperature"&br; Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials (Yokohama, Japan, September 12-15, 2006). -N. Tawara, H. Ohmi, Y. Terai, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br; "Characterization of epitaxial silicon films grown by atmosheric pressure plasma chemical vapor deposition at low temperatures (450-600oC)"&br; Extended Abstracts of the 2006 International Conference on Solid State Devices and Materials (Yokohama, Japan, September 12-15, 2006) pp. 1094-1095. -N. Tawara, H. Ohmi, Y. Terai, T. Shimura, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br; "Characterization of epitaxial Si films grown at low temperatures by atmospheric pressure plasma chemical vapor deposition"&br; Extended Abstracts of International 21st Century COE Symposium on Atomistic Fabrication Technology (Osaka, Japan, October 19-20, 2006) pp. 69-70. **¹ñºÝ²ñµÄȯɽ [#j38018c8] -Y. Fujiwara, K. Nakamura, S. Takemoto, J. Sugino, Y. Terai, M. Suzuki and M. Tonouchi:&br; "Direct observation of picosecond-scale energy-transfer processes in Er,O-codoped GaAs by pump-probe reflection technique"&br; 28th International Conference on Physics of Semiconductors (ICPS-28), ''FrM2g.33'', Vienna, Austria, July 24-28 (2006). -Y. Terai, Y. Maeda and Y. Fujiwara:&br; "Nondestructive investigation of b-FeSi2/Si interface by photoluminescence measurements"&br; Asia-Pacific Conference on Semiconducting Silicides: Science and Technology towards Sustainable Optoelectronics (APAC-SILICIDE 2006), ''B-2'', Kyoto, Japan, July 29-31 (2006). -Y. Terai, A. Mishina, I. Yamauchi and Y. Fujiwara:&br; "Growth of bulk b-FeSi2 by peritectoid reaction of faceted e-FeSi and a-Fe2Si5 single crystals"&br; Asia-Pacific Conference on Semiconducting Silicides: Science and Technology towards Sustainable Optoelectronics (APAC-SILICIDE 2006), ''D-4'', Kyoto, Japan, July 29-31 (2006). -T. Tokuno, H. Ichida, Y. Terai, Y. Kanematsu and Y. Fujiwara:&br; "Oxygen concentration dependence of photoluminescence properties in Er, O-codoped GaAs"&br; International Symposium on Design of Advanced Materials Using Nano Space (ISDAM-2006), ''P-34'', Osaka, Japan, August 4 (2006). -K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Electrical properties of carbon-doped silicon oxide films deposited using TEOS at room temperature"&br; International Symposium on Design of Advanced Materials Using Nano Space (ISDAM-2006), ''P-71'', Osaka, Japan, August 4 (2006). -S. Takemoto, T. Terao, Y.Terai, M. Yoshida, A. Koizumi, H. Ohta, Y. Takeda, N. Fujimura and Y. Fujiwara:&br; "Magnetic properties of Er,O-codoped GaAs at low temperature"&br; 4th International Conference on Physics and Applications of Spin Related Phenomena in Semiconductors (PASPS-IV), ''PB-43'', Sendai, Japan, August 15-18 (2006). -Y. Terai, Y. Maeda and Y. Fujiwara:&br; "Photoluminescence properties of ion-beam synthesized b-FeSi2/Si interface"&br; International Workshop on Sustainable Energy and Materials (IWSEM2006), ''3-3-3'', Tokyo, Japan, September 5 (2006).&br; ¡Ú¾·ÂÔ¹Ö±é¡Û -K. Yamaoka, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Room-temperature growth of silicon oxide films by plasma-enhanced chemical vapor deposition"&br; International Workshop on Sustainable Energy and Materials (IWSEM2006), ''3-p-7'', Tokyo, Japan, September 5 (2006). -K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Thermally stable carbon-doped silicon oxide films deposited at room temperature"&br; 2006 International Conference on Solid State Devices and Materials (SSDM 2006), ''P-2-3'', Yokohama, Japan, September 12-15 (2006). -N. Tawara, H. Ohmi, Y. Terai, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br; "Characterization of epitaxial silicon films grown by atmosheric pressure plasma chemical vapor deposition at low temperatures (450-600°C)"&br; 2006 International Conference on Solid State Devices and Materials (SSDM 2006), ''I-8-4'', Yokohama, Japan, September 12-15 (2006). -N. Tawara, H. Ohmi, Y. Terai, T. Shimura, H. Kakiuchi, H. Watanabe, Y. Fujiwara and K. Yasutake:&br; "Characterization of epitaxial Si films grown at low temperatures by atmospheric pressure plasma chemical vapor deposition"&br; International 21st Century COE Symposium on Atomistic Fabrication Technology, Osaka, Japan, October 19-20 (2006). -Y. Fujiwara, S. Takemoto, T. Tokuno, K. Hidaka, H. Ichida, M. Suzuki, Y. Terai, Y. Kanematsu and M. Tonouchi:&br; "Mechanism of excitation and relaxation in Er,O-codoped GaAs for 1.5mm light-emitting devices with extremely stable wavelength"&br; 2nd Workshop on Impurity Based Electroluminescence Devices and Materials (IBEDM 2006), ''F-17'', Wakayama, Japan, October 17-20 (2006).&br; ¡Ú¾·ÂÔ¹Ö±é¡Û **¹ñÆâ²ñµÄȯɽ [#u289af6a] -»³²¬·ÄÍ´¡¤µÈÇ÷͵»Ê¡¤²ÃÆ£±ÑÌÀ¡¤ÃÛ»³ÂçÊ塤Ãæ¼ÂçÊ塤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br; "TEOS¤òÍѤ¤¤ÆºîÀ½¤·¤¿SiOCHËì¤Ë´Þ¤Þ¤ì¤ëú²½¿åÁÇ´ð¤ÎǮŪµóÆ°"&br; Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''22p-ZP-1''¡Ö¹Ö±é¾©Îå¾Þ¼õ¾ÞµÇ°¹Ö±é¡×¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006). -ÃÛ»³ÂçÊ塤»³²¬·ÄÍ´¡¤Ãæ¼ÂçÊ塤µÈÇ÷͵»Ê¡¤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br; "¥ê¥â¡¼¥È¥×¥é¥º¥ÞCVDË¡¤Ë¤è¤ëSiOCHËì¤ÎÄã²¹À®Ë쵡¹½¤Î¸¡Æ¤"&br; Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''22p-ZP-2''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006). -ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br; "Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëEr¸÷Î嵯ÃÇÌÌÀѤλÀÁÇÇ»Åٰ͸À"&br; Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''23p-ZR-13''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006). -ÃÝËܾ±°ì¡¢Ãæ¼°ìɧ¡¢»û°æ·ÄÏ¡¢ÎëÌÚÀµ¿Í¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢ÅÍÆâÀ¯µÈ¡¢Æ£¸¶¹¯Ê¸¡§&br; "Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ë¸÷Î嵯¥¥ã¥ê¥¢¤Î´ËϤȥ¨¥Í¥ë¥®¡¼Í¢Á÷(2)"&br; Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''23p-ZR-14''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î23Æü (2006). -»°ÉÊÌÀÀ¸¡¢»û°æ·ÄÏ¡¢»³Æâͦ¡¢Æ£¸¶¹¯Ê¸¡§&br; "¥Õ¥¡¥»¥Ã¥È²½¤·¤¿e-FeSi¤Èa-Fe&subsc{2};Si&subsc{5};¤ÎÊñÀÏÈ¿±þ¤Ë¤è¤ëb-FeSi&subsc{2};·ë¾½¤ÎºîÀ½"&br; Âè53²ó±þÍÑʪÍý³Ø´Ø·¸Ï¢¹ç¹Ö±é²ñ¡¢''26a-C-7''¡¢É𢹩¶ÈÂç³ØÀ¤ÅÄ륥ã¥ó¥Ñ¥¹¡¢ÅìµþÅÔÀ¤ÅÄë¶è¡¢3·î26Æü (2006). -Åĸ¶Ä¾¹ä¡¢Â绲¹¨¾»¡¢»û°æ·ÄÏ¡¢³ÀÆâ¹°¾Ï¡¢ÅÏÉôÊ¿»Ê¡¢Æ£¸¶¹¯Ê¸¡¢°ÂÉð·é¡§&br; "Â絤°µ¥×¥é¥º¥ÞCVDË¡¤Ë¤è¤Ã¤ÆÄã²¹À®Ä¹¤·¤¿Si¥¨¥Ô¥¿¥¥·¥ã¥ëËì¤Îɾ²Á"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''29a-X-8''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î29Æü (2006). -»³²¬·ÄÍ´¡¤µÈÇ÷͵»Ê¡¤²ÃÆ£±ÑÌÀ¡¤ÃÛ»³ÂçÊ塤Ãæ¼ÂçÊ塤»û°æ·ÄÏ¡¤Æ£¸¶¹¯Ê¸¡§&br; "TEOS¤òÍѤ¤¤ÆºîÀ½¤·¤¿SiOCHËì¤Ë´Þ¤Þ¤ì¤ëú²½¿åÁÇ´ð¤ÎǮŪµóÆ°"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''29p-X-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î29Æü (2006). -Æü¹â·½Æó¡¢Ê¿¾¾Î´¡¢Æ£°æ·Å¡¢»û°æ·ÄÏ¡¢Æ£¸¶¹¯Ê¸¡§&br; "OMVPEÀ®Ä¹¤·¤¿Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëGaAs¥Ð¥ó¥Éüȯ¸÷¤Îɾ²Á"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''30a-H-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î30Æü (2006). -ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢¾®Àô½ß¡¢ÃÝÅÄÈþÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br; "ÅÅήÃíÆþ·¿Er,O¶¦Åº²ÃGaAsȯ¸÷¥Ç¥Ð¥¤¥¹¤Ë¤ª¤±¤ëErÎ嵯ÃÇÌÌÀѤάÄê²¹Åٰ͸À"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''30a-H-6''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î30Æü (2006). -»û°æ·ÄÏ¡¢¶¶ËÜÀµÂÀϺ¡¢Æ£¸¶¹¯Ê¸¡¢ÆîÆâ»Ì¡¢µÜÅĽӹ°¡¢ÀаæÞ¡§&br; "³Æ¼ïÅ´¥½¡¼¥¹¤«¤éºîÀ½¤·¤¿b-FeSi&subsc{2};¤Îȯ¸÷¥¹¥Ú¥¯¥È¥ë"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''31p-RD-4''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢8·î31Æü (2006). -ÃÝËܾ±°ì¡¢Æü¹â·½Æó¡¢»û°æ·ÄÏ¡¢ÎëÌÚÀµ¿Í¡¢ÅÍÆâÀ¯µÈ¡¢Æ£¸¶¹¯Ê¸¡§&br; "Æ©²á·¿¥Ý¥ó¥×¡¾¥×¥í¡¼¥ÖË¡¤Ë¤è¤ëErź²ÃGaAs¤Ë¤ª¤±¤ë¸÷Î嵯¥¥ã¥ê¥¢¥À¥¤¥Ê¥ß¥¯¥¹"&br; Âè67²ó±þÍÑʪÍý³Ø²ñ³Ø½Ñ¹Ö±é²ñ¡¢''1a-P15-37''¡¢Î©Ì¿´ÛÂç³Ø¤Ó¤ï¤³¡¦¤¯¤µ¤Ä¥¥ã¥ó¥Ñ¥¹¡¢ÁðÄŻԡ¢9·î1Æü (2006). -Æ£°æ·Å¡¢Æüüâ·½Æó¡¢Ê¿¾¾Î´¡¢»û°æ·ÄÏ¡¢Æ£¸¶¹¯Ê¸¡§&br; "OMVPEÀ®Ä¹¤·¤¿Er,O¶¦Åº²ÃGaAs¤Îȯ¸÷ÆÃÀ¤ËµÚ¤Ü¤¹´ðÈIJ¹Å٤αƶÁ"&br; ÆüËܶⰳزñ2006ǯ½©´ü¡ÊÂè139²ó¡ËÂç²ñ¡¢''683''¡¢¿·³ãÂç³Ø¡¢¿·³ã»Ô¡¢(2006). **¸¦µæ²ñ [#t64be420] -Æ£¸¶¹¯Ê¸¡¢Æ£Â¼µªÊ¸¡¢ÂÀÅĿΡ¢ÂçÞ¼ÇîÀë¡¢ÅÍÆâÀ¯µÈ¡¢Çò°æ¸÷±À¡§&br; "´õÅÚÎีÁÇź²ÃȾƳÂΤο·Å¸³«¡§Ãá½øÀ©¸æ¤Ë¤è¤ë¿·¤·¤¤¥¹¥Ô¥óʪÀ¤Îȯ¸½"&br; ʸÉô²Ê³Ø¾Ê²Ê³Ø¸¦µæÈñÊä½õ¶âÆÃÄêÎΰ踦µæ¡ÖȾƳÂΥʥΥ¹¥Ô¥ó¥È¥í¥Ë¥¯¥¹¡×¡¢Ê¿À®17ǯÅÙ¸¦µæÀ®²ÌÊó¹ð²ñ¡¢Åìµþ¹©¶ÈÂç³Ø¥Ç¥£¥¸¥¿¥ë¿ÌÜŪ¥Û¡¼¥ë¡¢ÅìµþÅÔÌܹõ¶è¡¢1·î25Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "¥Ü¥È¥à¥¢¥Ã¥×·¿µ¡Ç½À©¸æ¤Ë¤è¤ë¹â¼¡Î̻ҵ¡Ç½ºàÎÁ¤ÎÁÏÀ½"&br; ÂçºåÂç³ØÀèüµ»½Ñ¥Ç¥¶¥¤¥ó¥»¥ó¥¿¡¼¥ï¡¼¥¥ó¥°¥°¥ë¡¼¥×¡¡Âè1²ó¥·¥ó¥Ý¥¸¥¦¥à¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢1·î27Æü (2006). -Æ£¸¶¹¯Ê¸¡¢»û°æ·ÄÏ¡¢ÅÍÆâÀ¯µÈ¡¢»ÔÅĽ¨¼ù¡§&br; "´õÅÚÎàź²ÃȾƳÂΤÎÃá½øÀ©¸æ¤È¹â¼¡È¯¸÷µ¡Ç½¤Îȯ¸½"&br; ʸÉô²Ê³Ø¾Ê²Ê³Ø¸¦µæÈñÊä½õ¶âÆÃÄêÎΰ踦µæ¡Ö´õÅÚÎà·ÁÂÖÀ©¸æ¡×Ê¿À®17ǯÅÙÀ®²Ìȯɽ²ñ¡¢ÂçºåÂç³ØÃæÇ·Å祻¥ó¥¿¡¼¡¢Âçºå»ÔË̶衢1·î31Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "¥Ü¥È¥à¥¢¥Ã¥×·¿µ¡Ç½À©¸æ¤Ë¤è¤ë¿·µ¬Î̻ҵ¡Ç½ºàÎÁ¤ÎÁÏÀ½"&br; 21À¤µªCOE¥×¥í¥°¥é¥à¡Ö¹½Â¤¡¦µ¡Ç½Àè¿ÊºàÎÁ¥Ç¥¶¥¤¥ó¸¦µæµòÅÀ¤Î·ÁÀ®¡×Âè4²ó¥·¥ó¥Ý¥¸¥¦¥à¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î8Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "´õÅÚÎàź²ÃȾƳÂΤò´ðÈפȤ·¤¿ÇÈĹĶ°ÂÄêȯ¸÷¥Ç¥Ð¥¤¥¹¤Î³«È¯"&br; 2005ǯÅÙÂçºåÂç³ØÀèü²Ê³Ø¥¤¥Î¥Ù¡¼¥·¥ç¥ó¥»¥ó¥¿¡¼VBLÉôÌç¸ø³«À®²Ìȯɽ²ñ¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î15Æü (2006). -ÆÁÌî¹äÂç¡¢²Ï¼¿¸¸ã¡¢»ÔÅĽ¨¼ù¡¢»û°æ·ÄÏ¡¢·ó¾¾ÂÙÃË¡¢Æ£¸¶¹¯Ê¸¡§&br; "Er,O¶¦Åº²ÃGaAs¤Ë¤ª¤±¤ëErÎ嵯ÃÇÌÌÀѤÎɾ²Á"&br; 2005ǯÅÙÂçºåÂç³ØÀèü²Ê³Ø¥¤¥Î¥Ù¡¼¥·¥ç¥ó¥»¥ó¥¿¡¼VBLÉôÌç¸ø³«À®²Ìȯɽ²ñ¡¢ÂçºåÂç³Ø¶ä°É²ñ´Û¡¢¿áÅĻԡ¢3·î15Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "·-¹Â²²½¹çʪȾƳÂθ÷¥Ç¥Ð¥¤¥¹¤Î¿·¤·¤¤Ä¬Î®"&br; ÆüËܶⰳزñ¥»¥ß¥Ê¡¼¡ÖÈ󥷥ꥳ¥óȾƳÂΤθ½¾õ¤ÈŸ˾¡×¡¢Ê¸Éô²Ê³Ø¾Ê¸¦µæ¸òή¥»¥ó¥¿¡¼¡¢¤Ä¤¯¤Ð»Ô¡¢3·î29Æü (2006). -K. Hidaka, T. Hiramatsu, Y. Terai and Y. Fujiwara:&br; "Photoluminescence properties of Er,O-codoped GaAs grown by organometallic vapor phase epitaxy using Er(DPM)&subsc{3};"&br; 25th Electronic Materials Symposium, ''A4'', pp. 10-11¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006). -S. Takemoto, K. Nakamura, K. Hidaka, Y. Terai, M. Suzuki, M. Tonouchi and Y. Fujiwara:&br; "Ultrafast relaxation process of photoexcited carriers in Er-doped GaAs"&br; 25th Electronic Materials Symposium, ''A5'', pp. 12-13¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006). -T. Tokuno, S. Kawamura, H. Ichida, Y. Terai, A. Koizumi, Y. Takeda, Y. Kanematsu and Y. Fujiwara:&br; "Oxygen concentration dependence of Er optical excitation cross section in Er,O-codoped GaAs"&br; 25th Electronic Materials Symposium, ''A6'', pp. 14-15¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î5Æü (2006). -D. Tsukiyama, K. Yamaoka, D. Nakamura, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Investigation of low-temperature deposition of SiOCH film by remote plasma-enhanced chemical vapor deposition using TEOS"&br; 25th Electronic Materials Symposium, ''J4'', pp. 258-259¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î7Æü (2006). -K. Yamaoka, H. Kato, D. Tsukiyama, Y. Yoshizako, Y. Terai and Y. Fujiwara:&br; "Thermal stability and electrical properties of SiOCH films deposited PECVD at low temperature"&br; 25th Electronic Materials Symposium, ''J6'', pp. 262-263¡¢¥Û¥Æ¥ë¥µ¥ó¥Ð¥ì¡¼Éٻθ«¡¢°ËƦ¤Î¹ñ»Ô¡¢7·î7Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "¥Ü¥È¥à¥¢¥Ã¥×·¿µ¡Ç½À©¸æ¤Ë¤è¤ë¿·µ¬Î̻ҵ¡Ç½ºàÎÁ¤ÎÁÏÀ½¡Á´õÅÚÎàź²ÃȾƳÂΤÎÃá½øÀ©¸æ¤òÎã¤È¤·¤Æ¡Á"&br; »°Âç³ØÏ¢·ÈÍý²ÊÂç¥Þ¥°¥Í¥Æ¥£¥¯¥¹¥°¥ë¡¼¥×¸¦µæ²ñ¡¢ÅìµþÍý²ÊÂç³ØÌîÅÄ¥¥ã¥ó¥Ñ¥¹¡¢ÌîÅĻԡ¢8·î5Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "¥Õ¥©¥È¥ë¥ß¥Í¥Ã¥»¥ó¥¹Ë¡"&br; ±þÍÑʪÍý³Ø²ñÅ쳤»ÙÉôÂè9²ó´ðÁÃ¥»¥ß¥Ê¡¼¡ÖÇöËì¤Îɾ²Áµ»½Ñ¡×, ̾¸Å²°¹©¶ÈÂç³Ø¡¢Ì¾¸Å²°»Ô¡¢9·î28-29Æü (2006). -T. Tokuno, A. Fujita, H. Ichida, Y. Terai, Y. Kanematsu and Y. Fujiwara:&br; "Investigation on the mechanism of Er luminescence in Er,O-codoped GaAs"&br; ʸÉô²Ê³Ø¾Ê²Ê³Ø¸¦µæÈñÊä½õ¶âÆÃÄêÎΰ踦µæ¡Ö´õÅÚÎà·ÁÂÖÀ©¸æ¡×¡¢Ê¿À®18ǯÅÙ´õÅÚÎà¼ã¼ê¸¦µæȯɽ²ñ¡¤O1-4¡¢Ï²λ³¥Þ¥ê¡¼¥Ê¥·¥Æ¥£ ¥í¥¤¥ä¥ë¥Ñ¥¤¥ó¥º¥Û¥Æ¥ë¡¢Ï²λ³»Ô¡¢10·î5Æü (2006). -Æ£¸¶¹¯Ê¸¡§&br; "Â絬Ìϸ÷¾ðÊóήÄÌÍÑÇÈĹĶ°ÂÄê¿·µ¬È¾Æ³ÂΥ졼¥¶¡¼¤Î³«È¯"&br; ¸¦µæÀ®²Ì³èÍѥץ饶ÂçºåÀ®²ÌÊó¹ð²ñ¡¢Âçºå¹ñºÝ²ñµÄ¾ì¡¢Âçºå»Ô¡¢10·î23Æü (2006).&br; ¡Ú¾·ÂÔ¹Ö±é¡Û -Æ£¸¶¹¯Ê¸¡§&br; "ÇÈĹĶ°ÂÄê¿·µ¬È¾Æ³Âθ÷¸»¤Î³«È¯"&br; Â裱²ó¤±¤¤¤Ï¤ó¤Ê¿·»º¶ÈÁϽС¦¸òή¥»¥ó¥¿¡¼¡¡¥·¡¼¥º¥Õ¥©¡¼¥é¥à¡Á¸÷²Ê³Ø¤¬Âó¤¯Íµ¡ºàÎÁ¡¦Ìµµ¡ºàÎÁ¡Á¡¢ÃæÇ·Å祻¥ó¥¿¡¼¥Ó¥ë¡¢Âçºå»Ô¡¢11·î15Æü (2006).&br; ¡Ú¾·ÂÔ¹Ö±é¡Û **Ãø½ñ [#j1fa3ff5] -Y. Fujiwara, A. J. Kenyon, B. Moine and P. Ruterana:&br; Optical Materials 28(6-7) (2006) pp. 575-896. [Rare earth doped photonic materials. Proceedings of the European Materials Research Society 2005 Spring Meeting - Symposium C].