Home > Members > SETSUHARA Yuichi


Affiliation Joining and Welding Research Institute
[concurrent post] Center for Advanced Structural and Functional Materials Design
Job Title Professor
E-mail E-mail
URL http://www.jwri.osaka-u.ac.jp/~dpt2/index.html


Doctor of Engineering, Graduate School of Engineering, Osaka University
Specialist, Japan International Cooperation Agency (JICA)
Lecturer, Transdisciplinary Fluid Integration Research Center, Tohoku University
Professor, Joining and Welding Research Institute, Osaka University

Research Keywords

Surface modification, Plasma science and engineering, Plasma and ion engineering, non-equilibrium processes

Research Themes

Our research activities encompass work on development of new energy sources and process-control technologies for advanced materials processing, and span the range of applications from materials synthesis to their functionalization while maintaining excellence in science. These research activities are based on studies of energy transfer mechanisms involved in a variety of materials processing with energy sources (plasmas, particle beams and electromagnetic waves). Specific areas of research include development and advanced control of meters-scale large-are plasma sources for applications in giant electronics based on our novel discharge technologies ; synthesis of nanocomposite materials with plasma, particle and wet processes; and studies on non-equilibrium phonon-excitation processes for development of novel low-temperature processing of semiconductor devices.

Academic Societies

The Japan Society of Applied Physics, The Japan Society for Aeronautical and Space Sciences, The Surface Finishing Society of Japan, Japan Welding Society


Current Publications

Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Kazuaki Nishisaka: Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules, PLASMA PROCESSES & POLYMERS 4, S628-S632 (2007).

Kosuke Takenaka, Takashi Sera, Akinori Ebe, Yuichi Setsuhara: Production and Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna, PLASMA PROCESSES & POLYMERS 4, S1013-S1016 (2007).

Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe: Properties of Inductively-Coupled Plasmas Driven by Multiple Low-Inductance Internal-Antenna Units, PLASMA PROCESSES & POLYMERS 4, S1009-S1012 (2007).

Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna: Eiji Takahashi, Yasuaki Nishigami, Atsushi Tomyo, Masaki Fujiwara, Hirokazu Kaki, Kiyoshi Kubota, Tsukasa Hayashi, Kiyoshi Ogata, Akinori Ebe and Yuichi Setsuhara, Japanese Journal of Applied Physics Vol. 46, No. 3B, 2007, pp. 1280-1285 (2007).

Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation: Yusaku Izawa, Yasukazu Izawa, Yuichi Setsuhara, Masaki Hashida, Masayuki Fujita, Ryuichiro Sasaki, Hiroyuki Nagai and Makoto Yoshida, Appl. Phys. Lett. 90, 044107 (2007)

Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units: Osamu Tsuda, Masatou Ishihara, Yoshinori Koga, Shuzo Fujiwara, Yuichi Setsuhara, and Naoyuki Sato, J. Phys. Chem. B 109 (No. 11), pp. 4917-4922 (2005).