氏名 | 節原 裕一 SETSUHARA Yuichi |
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所属 | 接合科学研究所 (兼任)構造・機能先進材料デザイン教育研究センター |
職名 | 教授 |
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URL | http://www.jwri.osaka-u.ac.jp/~dpt2/index.html |
表面改質工学
新しい大面積・高密度プラズマ源の開発、表面改質加工プロセスならびに材料創成から宇宙推進への応用に加え、固体原子との熱的に非平衡なエネルギー変換・付与過程に注目した表面改質技術の開発と半導体プロセスへの応用に関する研究を行っています。
応用物理学会、日本航空宇宙学会、表面技術協会、溶接学会
Yuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Kazuaki Nishisaka: Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules, PLASMA PROCESSES & POLYMERS 4, S628-S632 (2007).
Kosuke Takenaka, Takashi Sera, Akinori Ebe, Yuichi Setsuhara: Production and Plasma Profiles of Inductively Coupled Plasmas Sustained with Low-Inductance Internal Antenna, PLASMA PROCESSES & POLYMERS 4, S1013-S1016 (2007).
Kosuke Takenaka, Yuichi Setsuhara, Kazuaki Nishisaka, Akinori Ebe: Properties of Inductively-Coupled Plasmas Driven by Multiple Low-Inductance Internal-Antenna Units, PLASMA PROCESSES & POLYMERS 4, S1009-S1012 (2007).
Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna: Eiji Takahashi, Yasuaki Nishigami, Atsushi Tomyo, Masaki Fujiwara, Hirokazu Kaki, Kiyoshi Kubota, Tsukasa Hayashi, Kiyoshi Ogata, Akinori Ebe and Yuichi Setsuhara, Japanese Journal of Applied Physics Vol. 46, No. 3B, 2007, pp. 1280-1285 (2007).
Ultrathin amorphous Si layer formation by femtosecond laser pulse irradiation: Yusaku Izawa, Yasukazu Izawa, Yuichi Setsuhara, Masaki Hashida, Masayuki Fujita, Ryuichiro Sasaki, Hiroyuki Nagai and Makoto Yoshida, Appl. Phys. Lett. 90, 044107 (2007)
Characterization of Amorphous Hydrogenated Carbon Formed by Low-Pressure Inductively Coupled Plasma Enhanced Chemical Vapor Deposition Using Multiple Low-Inductance Antenna Units: Osamu Tsuda, Masatou Ishihara, Yoshinori Koga, Shuzo Fujiwara, Yuichi Setsuhara, and Naoyuki Sato, J. Phys. Chem. B 109 (No. 11), pp. 4917-4922 (2005).