Home > Members > FUJIWARA Yasufumi

FUJIWARA Yasufumi

Name FUJIWARA Yasufumi
Affiliation Division of Materials and Manufacturing Science, Graduate School of Engineering
[concurrent post] Center for Advanced Structural and Functional Materials Design
Job Title Professor
E-mail E-mail
URL http://www.mat.eng.osaka-u.ac.jp/mse6/index.html

Background

1981.3
Bachelor of Engineering, Faculty of Engineering Science, Osaka University
1983.3
Master of Engineering, Graduate School of Engineering Science, Osaka University
1986.9
Doctor of Engineering, Graduate School of Engineering Science, Osaka University
1985.8-1991.1
Assistant Professor, Osaka University
1991.1-1993.3
Lecturer, Osaka University
1993.4-1997.3
Associate Professor, Faculty of Engineering, Nagoya University
1995.11-1996.1
Visiting Associate Professor, The University of Illinois at Urbana-Champaign
1997.4-2003.6
Associate Professor, Graduate School of Engineering, Nagoya University
2003.7-
Professor, Graduate School of Engineering, Osaka University
2003.7-2004.3
Part-time Lecturer, Graduate School of Engineering, Nagoya University
2006.4-2008.3
Visiting Professor, Tokyo University of Science
2006.4-2006.9
Part-time Lecturer, Department of Arts and Science, Osaka Kyoiku University
2007.4-2007.9
Part-time Lecturer, Department of Arts and Science, Osaka Kyoiku University
2007.10-2008.3
Part-time Lecturer, Graduate School of Engineering, Kyoto University

Research Keywords

Electronic materials, crystal growth, solid state physics

Research Themes

Bottom-up controlled synthesis and device applications of new quantum materials, Atomically-controlled growth and light-emitting device applications of rare-earth doped semiconductors, Characterization of optical, magnetic and transport properties of rare-earth doped semiconductors, Atomically-controlled growth and characterization of semiconductor quantum structures, plasma-enhanced chemical vapor deposition and device applications of functional oxides thin films, Atomically-controlled growth and device applications of silicide semiconductors

Academic Societies

The Japan Society of Applied Physics, The Japan Institute of Metals, The Society of Materials Science, Japan

Awards

Current Publications

Influence of plasma gases on insulating properties of low-temperature deposited SiOCH films by remote plasma-enhanced chemical vapor deposition, K. Yamaoka, N. Okada, Y. Yoshizako, Y. Terai and Y. Fujiwara, Japanese Journal of Applied Physics 46(4B) (2007) pp. 1997-2000., 2007.4

Magnetic properties of Er,O-codoped GaAs at low temperature, S. Takemoto, T. Terao, Y. Terai, M. Yoshida, A. Koizumi, H. Ohta, Y. Takeda, N. Fujimura and Y. Fujiwara, Physica Status Solidi (c) 3(12) (2006) pp. 4082-4085, 2007.1

Growth of bulk β-FeSi2 crystals by annealing of well aligned solidification structures, A. Mishina, T. Akahori, Y. Terai, I. Yamauchi and Y. Fujiwara, Physica B 376-377 (2006) pp. 795-798, 2006.12

Direct observation of trapping of photoexcited carriers in Er,O-codoped GaAs, K. Nakamura, S. Takemoto, Y. Terai, M. Suzuki, A. Koizumi, Y. Takeda, M. Tonouchi and Y. Fujiwara, Physica B 376-377 (2006) pp. 556-559, 2006.12

Room-temperature operation of injection-type 1.5 μm light-emitting diodes with Er,O-codoped GaAs, Y. Fujiwara, Materials Transactions 46(9) (2005) pp. 1969-1974, 2005.9